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1

Metrology for the next generation of semiconductor devices

Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

Journal:

Nature Electronics

Année:

2018

Langue:

english

Fichier:

PDF, 3.44 MB

english, 2018

2

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Calibrating optical overlay measurements

Lipscomb III, W. P., Archie, Chas N., Allgair, J. A., Bunday, B. D., Bishop, M. R., Silver, R. M., Attota, R., Stocker, M. D.

Année:

2006

Langue:

english

Fichier:

PDF, 1.56 MB

english, 2006

3

Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring

Settens, Charles, Cordes, Aaron, Bunday, Benjamin, Bello, Abner, Kamineni, Vimal, Paul, Abhijeet, Fronheiser, Jody, Matyi, Richard

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 5.12 MB

english, 2014

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Postek, Michael T., Raymond, Christopher J., Vladar, Andras E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Année:

2010

Langue:

english

Fichier:

PDF, 3.58 MB

english, 2010

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Gaps analysis for CD metrology beyond the 22nm node

Bunday, Benjamin, Germer, Thomas A., Vartanian, Victor, Cordes, Aaron, Cepler, Aron, Settens, Charles, Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 2.88 MB

english, 2013

6

Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring

Settens, Charles, Cordes, Aaron, Bunday, Benjamin, Bello, Abner, Kamineni, Vimal, Paul, Abhijeet, Fronheiser, Jody, Matyi, Richard

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 5.12 MB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Sanchez, Martha I., Ukraintsev, Vladimir A., Solecky, Eric, Rasafar, Allen, Cantone, Jason, Bunday, Benjamin, Vaid, Alok, Patterson, Oliver, Stamper, Andrew, Wu, Kevin, Buengener, Ralf, Weng, Weihao,

Année:

2017

Langue:

english

Fichier:

PDF, 1.52 MB

english, 2017

8

Time-dependent electron-beam-induced photoresist shrinkage effects

Bunday, Benjamin, Cordes, Aaron, Hartig, Carsten, Allgair, John, Vaid, Alok, Solecky, Eric, Rana, Narender

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2012

Langue:

english

Fichier:

PDF, 3.43 MB

english, 2012

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing

Resnick, Douglas J., Bencher, Christopher, Malloy, Matt, Thiel, Brad, Bunday, Benjamin D., Wurm, Stefan, Mukhtar, Maseeh, Quoi, Kathy, Kemen, Thomas, Zeidler, Dirk, Eberle, Anna Lena, Garbowski, Tomas

Année:

2015

Langue:

english

Fichier:

PDF, 694 KB

english, 2015

10

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California (Sunday 1 August 2010)] Instrumentation, Metrology, and Standards for Nanomanufacturing IV - Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820

Postek, Michael T., Postek, Michael T., Vladar, András E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Année:

2010

Langue:

english

Fichier:

PDF, 3.58 MB

english, 2010

11

Transmission electron microscope calibration methods for critical dimension standards

Orji, Ndubuisi G., Dixson, Ronald G., Garcia-Gutierrez, Domingo I., Bunday, Benjamin D., Bishop, Michael, Cresswell, Michael W., Allen, Richard A., Allgair, John A.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2016

Langue:

english

Fichier:

PDF, 2.71 MB

english, 2016

12

X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices

Kline, R. Joseph, Sunday, Daniel F., Windover, Donald, Bunday, Benjamin D.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2017

Langue:

english

Fichier:

PDF, 3.44 MB

english, 2017

13

Mathematical Modelling of Queues

Brian D. Bunday

Journal:

The Mathematical Gazette

Année:

1995

Langue:

english

Fichier:

PDF, 416 KB

english, 1995

14

70.26 Problems with Curve Fitting

Brian D. Bunday and Victor A. Kiri

Journal:

The Mathematical Gazette

Année:

1986

Langue:

english

Fichier:

PDF, 435 KB

english, 1986

15

Measuring multielectron beam imaging fidelity with a signal-to-noise ratio analysis

Mukhtar, Maseeh, Bunday, Benjamin D., Quoi, Kathy, Malloy, Matt, Thiel, Brad

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2016

Langue:

english

Fichier:

PDF, 4.03 MB

english, 2016

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Metrology capabilities and needs for 7nm and 5nm logic nodes

Sanchez, Martha I., Ukraintsev, Vladimir A., Bunday, Benjamin, Solecky, Eric, Vaid, Alok, Bello, A. F., Dai, Xintuo

Année:

2017

Langue:

english

Fichier:

PDF, 8.57 MB

english, 2017

17

(Invited) Materials and Processes for Superconducting Qubits and Superconducting Electronic Circuits on 300mm Wafers

Papa Rao, Satyavolu S., Hobbs, Christopher, Olson, Stephen, Foroozani, Neda, Chong, Hyuncher, Stamper, Harlan, Martinick, Brian, Ashworth, Dominic, Bunday, Benjamin, Malloy, Matthew, Holland, Eric, Na

Journal:

ECS Transactions

Année:

2018

Langue:

english

Fichier:

PDF, 556 KB

english, 2018

18

Patterned Wafer Inspection with Multi-beam SEM Technology

Thiel, Brad, Mukhtar, Maseeh, Quoi, Kathy, Bunday, Benjamin D., Malloy, Matt

Journal:

Microscopy and Microanalysis

Année:

2016

Langue:

english

Fichier:

PDF, 517 KB

english, 2016

19

Advanced Digital Communications

Journal:

Electronics and Power

Année:

1987

Langue:

english

Fichier:

PDF, 194 KB

english, 1987

20

6.5 Motor aftereffects during a combined hand-trunkgrasping task

K.L. Bunday, D.A. Green, A.M. Bronstein

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 278 KB

english, 2005

21

5.4 Visuo-vestibular influences involved in the ‘brokenescalator’ gait aftereffect

K.L. Bunday, A.M. Bronstein

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 257 KB

english, 2005

22

7.2 The influence of learning and vision on the “brokenescalator phenomenon”

K.L. Bunday, R.E Reynolds, M. Rao, S. Salman, D. Kaski, A.M. Bronstein

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 126 KB

english, 2005

23

Digital Communications: Satellite/Earth Station Engineering

Journal:

Electronics and Power

Année:

1983

Langue:

english

Fichier:

PDF, 200 KB

english, 1983

24

A Check on Long Multiplication or Something More?

Journal:

Mathematics in School

Année:

1978

Langue:

english

Fichier:

PDF, 254 KB

english, 1978

25

A lack of essential fatty acids as a possible cause of hyperactivity in children

Colquhoun, Irene, Bunday, Sally

Journal:

Medical Hypotheses

Année:

1981

Langue:

english

Fichier:

PDF, 536 KB

english, 1981

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Simulating massively parallel electron beam inspection for sub-20 nm defects

Cain, Jason P., Sanchez, Martha I., Bunday, Benjamin D., Mukhtar, Maseeh, Quoi, Kathy, Thiel, Brad, Malloy, Matt

Année:

2015

Langue:

english

Fichier:

PDF, 1.80 MB

english, 2015

27

The Influence of the Chemical Additive Tartrazine on the Zinc Status of Hyperactive Children—a Double-blind Placebo-controlled Study

Ward, Neil I., Soulsbury, Kevin A., Zettel, Victor H., Colquhoun, Irene D., Bunday, Sally, Barnes, Belinda

Journal:

Journal of Nutritional and Environmental Medicine

Année:

1990

Langue:

english

Fichier:

PDF, 384 KB

english, 1990

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - High-speed atmospheric imaging of semiconductor wafers using rapid probe microscopy

Kohli, Priyanka, Lyons, Jeff, Humphris, Andrew D. L., Bunday, Benjamin D., Arceo, Abraham, Hamaguchi, Akira, Patel, Dilip, Bakker, David, Raymond, Christopher J.

Année:

2011

Langue:

english

Fichier:

PDF, 3.08 MB

english, 2011

29

Operational Researchby W. M. Harper; H. C. Lim

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Année:

1983

Langue:

english

Fichier:

PDF, 119 KB

english, 1983

30

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection

Behringer, Uwe F.W., Finders, Jo, Malloy, Matt, Thiel, Brad, Bunday, Benjamin D., Wurm, Stefan, Jindal, Vibhu, Mukhtar, Maseeh, Quoi, Kathy, Kemen, Thomas, Zeidler, Dirk, Eberle, Anna Lena, Garbowski,

Année:

2015

Langue:

english

Fichier:

PDF, 997 KB

english, 2015

31

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Bunday, Benjamin D., Bishop, Michael, McCormack, Jr., Donald W., Villarrubia, John S., Vladar, Andras E., Dixson, Ronald, Vorburger, Theodore V., Orji, N. G., Allgair, John A., Silver, Richard M.

Année:

2004

Langue:

english

Fichier:

PDF, 509 KB

english, 2004

32

Probability and Statistical Inference, I and IIby J. G. Kalbfleisch

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Année:

1981

Langue:

english

Fichier:

PDF, 209 KB

english, 1981

33

61.22 Pythagoras in Three Dimensions

Journal:

The Mathematical Gazette

Année:

1977

Langue:

english

Fichier:

PDF, 256 KB

english, 1977

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Dark-field optical scatterometry for line-width-roughness metrology

Zhuang, G. Vera, Spielman, Steven, Fielden, John, Wack, Daniel C., Poslavsky, Leonid, Bunday, Benjamin D., Allgair, John A., Raymond, Christopher J.

Année:

2009

Langue:

english

Fichier:

PDF, 507 KB

english, 2009

35

Foster carers' reflective understandings of parenting looked after children: an exploratory study

Bunday, L., Dallos, R., Morgan, K., McKenzie, R.

Journal:

Adoption & Fostering

Année:

2015

Langue:

english

Fichier:

PDF, 202 KB

english, 2015

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - CD-SEM metrology for sub-10nm width features

Cain, Jason P., Sanchez, Martha I., Bunday, Benjamin, Cepler, Aron, Cordes, Aaron, Arceo, Abraham

Année:

2014

Langue:

english

Fichier:

PDF, 3.42 MB

english, 2014

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - HVM metrology challenges toward the 5nm node

Sanchez, Martha I., Ukraintsev, Vladimir A., Bunday, Benjamin

Année:

2016

Langue:

english

Fichier:

PDF, 3.06 MB

english, 2016

38

Lattice Path Combinatorics with Statistical Applicationsby T. V. Naranaya

Review by: B. D. Bunday

Journal:

The Mathematical Gazette

Année:

1980

Langue:

english

Fichier:

PDF, 364 KB

english, 1980

39

The Growth of Elephant Herds

Journal:

The Mathematical Gazette

Année:

1970

Langue:

english

Fichier:

PDF, 232 KB

english, 1970

40

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Fundamental limits of optical critical dimension metrology: a simulation study

Silver, Richard, Archie, Chas N., Germer, Thomas, Attota, Ravikiran, Barnes, Bryan M., Bunday, Benjamin, Allgair, John, Marx, Egon, Jun, Jay

Année:

2007

Langue:

english

Fichier:

PDF, 624 KB

english, 2007

41

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Design and Process Integration for Microelectronic Manufacturing - Applications of image diagnostics to metrology quality assurance and process control

Allgair, John A., Boksha, Victor V., Bunday, Benjamin D., Diebold, Alain C., Cole, Daniel C., Davidson, Mark P., Hutcheson, Jerry D., Gurnell, Andrew W., Joy, David C., McIntosh, John M., Muckenhirn,

Année:

2003

Langue:

english

Fichier:

PDF, 3.25 MB

english, 2003

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Scatterometry for EUV lithography at the 22-nm node

Raymond, Christopher J., Bunday, Benjamin, Vartanian, Victor, Ren, Liping, Huang, George, Montgomery, Cecilia, Montgomery, Warren, Elia, Alex, Liu, Xiaoping

Année:

2011

Langue:

english

Fichier:

PDF, 4.27 MB

english, 2011

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Tool-to-tool matching issues due to photoresist shrinkage effects

Raymond, Christopher J., Bunday, Benjamin, Cordes, Aaron, Hartig, Carsten, Allgair, John, Vaid, Alok, Solecky, Eric, Rana, Narender

Année:

2011

Langue:

english

Fichier:

PDF, 5.78 MB

english, 2011

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Patterned defect and CD metrology by TSOM beyond the 22-nm node

Arceo, Abraham, Bunday, Benjamin, Vartanian, Victor, Attota, Ravikiran, Starikov, Alexander

Année:

2012

Langue:

english

Fichier:

PDF, 7.61 MB

english, 2012

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Experimental validation of 2D profile photoresist shrinkage model

Raymond, Christopher J., Bunday, Benjamin, Cordes, Aaron, Self, Andy, Ferry, Lorena, Danilevsky, Alex

Année:

2011

Langue:

english

Fichier:

PDF, 931 KB

english, 2011

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Impact of sampling on uncertainty: semiconductor dimensional metrology applications

Bunday, Benjamin, Allgair, John A., Raymond, Christopher J., Rijpers, Bart, Banke, Bill, Archie, Chas, Peterson, Ingrid B., Ukraintsev, Vladimir, Hingst, Thomas, Asano, Masafumi

Année:

2008

Langue:

english

Fichier:

PDF, 910 KB

english, 2008

47

A Causal Role for Primary Motor Cortex in Perception of Observed Actions

Palmer, Clare E., Bunday, Karen L., Davare, Marco, Kilner, James M.

Journal:

Journal of Cognitive Neuroscience

Année:

2016

Langue:

english

Fichier:

PDF, 481 KB

english, 2016

48

Dissecting direct and indirect pathways between ventral premotor cortex and the spinal cord by transcranial magnetic stimulation

Bunday, K.L., Pereira, M., Davare, M.

Journal:

Brain Stimulation

Année:

2017

Langue:

english

Fichier:

PDF, 45 KB

english, 2017

49

Publisher Correction: Metrology for the next generation of semiconductor devices

Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

Journal:

Nature Electronics

Année:

2018

Fichier:

PDF, 766 KB

2018

50

The science of decision making in business, industry, government and society: operational research. A guide to education and employment opportunities, edited by Dick Martin for the Education and Research Committee of the Operational Research Society. Pp. 25. 35p by post from the O.R. Society, Neville House, Waterloo Street, Birmingham B2 5TX

Journal:

The Mathematical Gazette

Année:

1980

Langue:

english

Fichier:

PDF, 75 KB

english, 1980